● Innovative CFE gun yielding ultra bright, stable probe current for high-resolution, low kV observations and elemental analyses
● High resolution performance (1.1 nm / 1 kV, 0.8 nm / 15 kV)
● Ultra-high vacuum gun and sample chambers to minimize contamination
● Optional Top Filter detection system for fine material contrast differentiation
|
SU8220 |
SU8230 |
SU8240 |
|
Secondary Electron Image Resolution*1 |
0.8 nm (Vacc 15 kV, WD=4 mm, Magnification 270 kx) |
|||
Landing voltage |
0.01-30 kV |
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Magnification |
20-1,000,000x*3 |
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Stage Control |
5-stage actuator |
5-stage actuator |
5-stage actuator |
|
Traverse range |
X |
0~50mm |
0~110mm |
0~110mm |
Y |
0~50mm |
0~110mm |
0~80mm |
|
R |
360° |
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Z |
1.5~30mm |
1.5~40mm |
1.5~40mm |
|
T |
-5~70° |
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Stage reproduction |
- |
- |
±0.5µm or less |
*1:Smallest particle gap measured in SEM images with Hitachi High-Tech samples
*2:Observation in deceleration mode
*3:Magnification specified based on a display size of 127 mm × 95 mm
*4:Regulus®(REGULated Ultra Stable: Hitachi High-Tech high-performance stage) is a registered trademark of Hitachi High-Technologies
Corporation in Japan and U.S.
Application Data
High Resolution Imaging
High Spatial resolution X-ray Microanalysis
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