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Kính hiển vi điện tử quét cho phân tích SU-70

Kính hiển vi điện tử quét cho phân tích SU-70

Model: SU-70
Tình trạng: Ngừng sản xuất
!Dòng sản phẩm đã ngừng sản xuất

The Hitachi SU-70 Analytical Field Emission SEM combines the field proven stability, high current and brightness of the Schottky electron source with ultra high resolution required for a multitude of analytical applications. Designed with a semi-in-lens optical configuration, Hitachi's patented ExB technology provides a unique electron signal filtering and mixing system suited for today' s demanding applications for research and development and multidiscipline studies.
A large specimen stage and analytical chamber accommodate a wide variety of analytical instrumentation such as EDS*, WDS*, EBSP*, CL*, STEM, and e-Beam Lithography techniques optimized for simultaneous analysis.
The SU-70 Analytical FESEM continues the tradition of industry leading technology with the quality and reliability of Hitachi products and services recognized throughout the industry.

*Option
Bảo hành: 12 tháng


Giá bán: Liên hệ




Đặt hàng
  • Khung giờ giao hàng từ 8h00 - 18h00 hàng ngày.
  • Sản phẩm chính hãng, cung cấp CO & CQ.
  • Bảo hành miễn phí 12 tháng với máy chính.
  • Giá trên chỉ áp dụng đối với mặt hàng có sẵn.
    Đối với mặt hàng không có sẵn sẽ tính thêm phí vận chuyển.
Gửi email yêu cầu báo giá: info@redstarvietnam.com            Tất cả các ngày trong tuần
Ultra High Resolution Imaging; 1 nm/15 kV, 1.6 nm/1 kV (with Beam Deceleration Moda)*
 
Ultra high resolution performance made possible with Hitachi's patented semi-in-lens optical design and electron gun technology.

 

In-lens SE and BSE Signal Filtering and Mixing Mode
 
Permits SE and BSE signal collection and control to eliminate or reduce specimen charging and enhance compositional contrast information.

 

Sub Nanometar Level Surface Observation at Ultra Low Accelerating Voltages
 
Provides high resolution, sub nanometer level surface observation at a ultra low accelerating voltage down to 100V by utilizing the electron beam deceleration function.

 

Maximum Probe Current of 100nA or Greater Available with the Field Proven Schottky Eleclron Source
 
High current and high resolution is optimized for analytical techniques such as EDS, WDS, EBSP, CL, and e-Beam lithography for increased productivity and throughput.

 

EBSP Analysis In Field Free (FF) Mode
 
Hitachi's unique FF mode eliminates the projected magnetic field of the objective lens associated with semi-in-lens technology thus eliminating artifacts during analysis of magnetic samples and with EBSP applications.

 

Large Analytical Specimen Chamber
 
Designed to optimize the simultaneous analysis of a wide variety of analytical techniques such as EDS, WDS, EBSP, CL and e-Beam Lithography by optimizing the analytical detector solid angle and maintaining high resolution.

 

*:Option
Kính hiển vi điện tử quét cho phân tích SU-70