Miniaturization of wafer manufacturing processes has promoted the shift towards shorter photolithography wavelengths. Currently, ArF lasers (193 nm) are most currently used. Research on the practical implementation of F2 (157 nm) has reduced the imprinting node to 0.07 µm.

The V-1000 was designed to evaluate optical properties in the wavelength range between 115 and 300 nm. Typically, instrument optical paths for analyses in this range are evacuated due to the strong absorption of oxygen, thus, the 'acuum' ultraviolet range. The V-1000 provides rapid sample measurements without evacuation of the entire instrument by using a nitrogen purge and dual sample exchange cabinets to enhance purge efficiency. Superior photometric reproducibility is achieved by using a double monochromator for elimination of stray light and a reference stabilized double-beam system to maintain baseline stability.

System Features

• Highly accurate measurements in the vacuum UV range
  Double monochromator and reference stabilized double-beam system achieves a photometric reproducibility of 0.03%.
  
  
• Rapid switchover between transmission/reflection measurement
  Samples are easily loaded for either reflection measurements at 5 or 45 or transmission measurements without replacing sampling accessories. Please contact us if you require a special configuration.
  
  
• Quick measurements
  By increasing purge efficiency and eliminating dead space in the optical path, measurements are completed within minutes.

%T Transmission measurement	%R Reflection measurement

Superb Photometric Reproducibility

・This example uses a calcium fluoride window 30 mm in diameter and 2 mm thick.
・One hundred consecutive measurements were taken on five separate occasions using a wavelength of 157.6 nm.

Measurement	Averaged Transmittance	Standard Deviation (Num. of Samples : 100)
1	86.07 %	0.025 %
2	86.03 %	0.023 %
3	86.02 %	0.023 %
4	86.04 %	0.024 %
5	86.05 %	0.025 %