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Ion Milling System ArBlade 5000

State: In stock
The most advanced broad ion beam system for producing exceptionally high-quality cross-section or flat-milling samples for electron microscopy.
Warranty: No warranty infomation


Price: Contact us




Order
  • Delivery time: 8h00 - 18h00 daily
  • Genuine product, provided width CO, CQ
  • 03 months of free warranty for consumable and accessories
  • 12 months of free warranty for main equipment
  • Accessorie's price is applied only when purchased with
    main equipment
  • Contact us for any particular accessory's quotion
Email: info@redstarvietnam.com Every day in week

Cross-section milling rate: 1 mm/hour!*1

The ArBlade 5000 is equipped with a fast-milling Ar ion gun with a milling rate twice as high for cutting-edge performance, thus dramatically reducing the processing time for cross-section preparation.

(*1) Si protrudes 100 um from the mask edge.

Comparison of cross-section milling

(Specimen: lead for mechanical pencil, Milling time : 1.5 hours)

IM4000PLUS ArBlade 5000
IM4000PLUS

ArBlade 5000

 

Cross-section widths up to 8 mm!

For large-area milling requirements such as electronic-device applications, a revolutionary cross-section milling holder design has been developed for wider-area fabrication.

 

 

Example of wide-area cross-section milling

(Specimen: electronic component, Milling time: 5 hours)

Enlarged of the red frame Enlarged of the left image

Enlarged of the red frame

Enlarged of the left image 

 

 

 

Hybrid Model: Dual-Milling Configuration Available

The all new ion-milling system is equipped with both cross-section milling and flat milling modes for the most complex application needs.
Equipped with multiple holders, the ArBlade 5000 system accommodates a wide range of applications.

Cross-section Milling

Used to produce wider, undistorted cross sections without applying mechanical stress to the sample

Flat Milling

Used for removing surface layer artifacts and final polish after traditional mechanical polishing techniques.

Image of Cross-section Milling Image of Flat Milling
Image of Cross-section Milling

Image of Flat Milling

 



Cooling unit*

ArBlade5000 with CTC
ArBlade5000 with CTC

 

 

Cryogenic versions of the ArBlade 5000 provide active cooling of the cross-section milling stage during sample processing. An integrated liquid nitrogen dewar connected to the cross-section stage effectively removes heat induced during ion-beam milling from the shielding mask and sample.

*
Factory fit only

- The digital Cryo Temperature Control (CTC) unit allows operators to set a desired cooling temperature by placing a heater and sensor directly at the cross-section shielding mask so that a desired process temperature can be accurately maintained.

- At the conclusion of cryo-milling, the specimen stage is gently warmed up to room temperature in order to avoid ice formation or water condensation on the sample surface.

- Sample cooling can support damage-free cross-section milling of highly temperature-sensitive specimen such as polymers or soft metals. However, even with active cooling applied, it is important to choose proper processing parameters for best results. This is especially important for samples with low thermal conductivity because the heat generated at the direct ion-beam point of impact must first be effectively conducted to other regions of the specimen. The ArBlade 5000 with CTC provides high ion-beam currents even at lower "gentle" accelerating voltages and is, therefore, optimally suited for this and other processing techniques.

 

Specimen : wood alloy

Without cooling With cooling

Without cooling

With cooling

 

 

 

Mô tả
Khí sử dụng Ar(argon) gas
Điện áp gia tốc 0 to 8 kV
Phay mặt cắt ngang
Tốc độ phay tối đa (Chất liệu: Si) ≥ 1 mm/hr*1
Chiều rộng phay tối đa 8 mm (sử dụng giá đỡ phay mặt cắt ngang diện rộng)
Kích thước mẫu tối đa 20(W) × 12(D) × 7(H) mm
Phạm vi di chuyển mẫu X ±7 mm, Y 0 đến +3 mm
Chiếu xạ chùm Ion không liên tục Chức năng tiêu chuẩn
Góc xoay ±15°, ±30°, ±40°
Phay mặt cắt phẳng
Diện tích phay φ32 mm
Kích thước mẫu tối đa φ50 × 25(H) mm
Phạm vi di chuyển mẫu X 0 to +5 mm
Chiếu xạ chùm Ion không liên tục Chức năng tiêu chuẩn
Tốc độ quay 1 r/m, 25 r/m
Tile 0 to 90°
(*1) Si nhô ra 100 µm từ mép mặt nạ.

Tùy chọn

Thiết bịMô tả
Bộ điều khiển làm mát*2 Làm mát gián tiếp bằng LN2, Phạm vi nhiệt độ cài đặt: 0 đến -100 ° C
Mặt nạ chịu chùm tia Cứng gấp đôi so với mặt nạ tiêu chuẩn.
Thiết bị thu phóng kính hiển vi soi nổi Độ phóng đại 15 đến 100, loại Binocular, tyoe Trinocular (tương ứng với camera CCD)
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