Feature
1.Substantially Larger Specimen Chamber Accommodates Oversized and Heavy Samples
■Robust Stage for Flexibility in Sample Size, Shape, and Weight
■Increased Viewing Area—SEM MAP Expands the Boundaries of Sample Navigation
2.Evolution of the Market—Improved Automatic Functions for Operators of Any Skill Level
■Multiple Modes of Operation
■ Automatic Functions for Operators of Any Skill Level
■Multi Zigzag enables wide-area observation across multiple areas.
■Report Creator generates reports of acquired data.
3.Integrated Solutions for Various Applications
■High Sensitivity Detectors Supporting All Observation Requirements
■A Variety of Accessories Mountable onto Any of the 20 Ports in the Innovative SU3900 Specimen Chamber.
■SEM/EDS Integration System*
■3D Modeling Software: Hitachi map 3D*
■Image Processing, Measurement, and Analysis Software: Image-Pro for Hitachi
*optional
| Items | Product Features | ||
|---|---|---|---|
| SU3800 | SU3900 | ||
| Secondary Electron Resolution | 3.0 nm (accelerating voltage 30 kV, WD＝5 mm, high vacuum mode) | ||
| 15.0 nm (accelerating voltage 1 kV, WD＝5 mm, high vacuum mode) | |||
| Backscattered Electron Resolution | 4.0 nm (accelerating voltage 30 kV, WD＝5 mm, low vacuum mode) | ||
| Magnification | ×5 to ×300,000 (magnification of image*1) | ||
| ×7 to ×800,000 (magnification of actual display*2) | |||
| Accelerating Voltage | 0.3 kV to 30 kV | ||
| Low Vacuum Mode Setting | 6 to 650 Pa | ||
| Image Shift | ± 50 µm (WD＝10 mm) | ||
| Maximum Specimen Size | Φ 200 mm | Φ 300 mm | |
| Specimen Stage | X | 0 to 100 mm | 0 to 150 mm |
| Y | 0 to 50 mm | 0 to 150 mm | |
| Z | 5 to 65 mm | 5 to 85 mm | |
| R | 360° in continuous mode | ||
| T | －20 to +90° | ||
| Maximum Movable Range | Φ 130 mm (in combination with R) | Φ 200 mm (in combination with R) | |
| Maximum Movable Height | 80 mm (WD= 10 mm) | 130 mm (WD= 10 mm) | |
| Motor Drive | 5-axis motor drive | ||
| Electron Optics | Electron-Gun | Pre-centered cartridge type tungsten hairpin filament | |
| Objective-Lens Aperture | 4-hole movable aperture | ||
| Detectors | Secondary electron detector, sensitive semiconductor backscattered electron detector | ||
| WD for EDX analysis | WD＝10 mm (T.O.A＝35°) | ||
| Image Display | Auto-Axis Alignment. Function | Beam control : auto (AFS→ABA→AFC→ABCC) | |
| Optical axis adjustment: auto (current alignment) | |||
| Beam brightness: auto | |||
| Auto Image Adjustment Function | Auto brightness and contrast control (ABCC) | ||
| Auto focus control (AFC) | |||
| Auto stigma and focus (ASF) | |||
| Auto filament saturation (AFS) | |||
| Auto beam alignment (ABA) | |||
| Auto start (HV-ON→ABCC→AFC) | |||
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