FilmTek 2000 SE
Multi-angle reflectometry and ellipsometry for advanced thin film and multi-layer mapping on unpatterned films
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FilmTek 2000 SE
The FilmTek™ 2000 SE is a benchtop spectroscopic ellipsometer with an automated stage that can accommodate 300mm wafers, allowing for uniformity measurements of thin films. Utilizing an advanced rotating compensator design, the 2000 SE delivers unmatched measurement performance and speed for thin film applications. Our film modeling software and in-house dispersion formula allow for easy data processing, giving accurate and precise real-time results.
Measurement Capabilities
Enables simultaneous determination of:
- Multiple layer thicknesses
- Indices of refraction [ n(λ) ]
- Extinction (absorption) coefficients [ k(λ) ]
- Energy band gap [ Eg ]
- Composition (e.g., %Ge in SiGex, % Ga in GaxIn1-xAs, %Al in AlxGa1-xAs, etc.)
- Surface roughness
- Constituent, void fraction
- Crystallinity/Amorphization (e.g., of Poly-Si or GeSbTe films)
- Film gradient
System Components
Standard:
- Spectroscopic ellipsometry with rotating compensator design (300nm-1700nm)
- Multi-angle, polarized spectroscopic reflection (240nm-1700nm)
- Measures film thickness and index of refraction independently
- Automated stage with autofocus
- Ideal for measuring ultra-thin films (0.03 Å repeatability on native oxide)
- Advanced material modeling software
- Bruker’s generalized material model with advanced global optimization algorithms
Optional:
- Generalized ellipsometry (4×4 matrix generalization method) for anisotropy measurements (nx, ny, nz)
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